Reflex mirror with soft x-ray multi-layer film and optical system using it

軟x線多層膜反射鏡及びこれを用いた光学系

Abstract

(57)【要約】 【目的】多層膜反射鏡の反射率を非常に高くでき、更に 多層膜反射鏡を用いた光学系でタンパク質の炭素の顕微 像を良好なコントラスト比で得ることである。 【構成】ダイヤモンド薄膜の層と、この薄膜と屈折率の 差が比較的大きい他の物質とを、基板1上に交互に積層 して多層膜反射鏡2を形成する。X線顕微鏡の光学系に おいて、対物レンズ7が、多層膜反射鏡2で構成する凹 面鏡8と凸面鏡9から成るシュワルツシルド光学系であ る。X線源4からの軟X線の波長はタンパク質の炭素の K吸収端より短波長で、1S電子がπ軌道に遷移すると きの共鳴エネルギーに相当する波長とする。
PURPOSE:To heighten the reflectivity of a multi-layer film reflex mirror and produce a microscopic image of protein carbon at a good contrast with an optical system using this reflex mirror. CONSTITUTION:Layers of diamond thin film and layers of another substance having a relatively large difference in the refractive index from the diamond thin film are placed on a base board 1 alternately to form a multi-layer film reflex mirror 2. In the optical system of an X-ray microscope, an objective lens 7 is of Schwarzschild optical system consisting of a concave mirror 8 and convex mirror 9 composed of the multi-layer film reflex mirror 2. The wavelength of soft X-ray frown an X-ray source 4 is shorter than the K absorption end of protein carbon, having a value corresponding to the resonance energy when a 1S-electron is transferred to the pi-orbit.

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    EP-1204002-A2May 08, 2002TRW Inc.EUV lithography system with thin-film coating for protection from laser-produced plasma
    EP-1204002-A3March 26, 2003TRW Inc.EUV lithography system with thin-film coating for protection from laser-produced plasma
    JP-2011007766-AJanuary 13, 2011National Institute Of Advanced Industrial Science & Technology, 独立行政法人産業技術総合研究所Sample support member for x-ray microscope, sample-housing cell, x-ray microscope, and method for observing x-ray microscopic image